The magnetic properties of Co: TiO2 thin film with low cobalt concentration was investigated. The Co: TiO2 thin films were grown on n-type Si (100) substrate using metal organic chemical vapour deposition technique. The cobalt concentration in the Co: TiO2 thin film was determined using energy dispersive X-ray spectrometer and the magnetic properties of the film was determined using a vibrating sample magnetometer. The energy dispersive X-ray spectrometer results show that the cobalt concentration in Co: TiO2 thin films (denoted by x) are x = 0, x = 0.2%, x = 0.3%, x = 0.7%, and x = 1.1%. The vibrating sample magnetometer results indicate that each (exclude x = 0) after film exhibits ferromagnetic properties at room temperature. Saturation magnetisation of Co: TiO2 thin film varies from 1,0 emu/cm³ to 4,4 emu/cm³ and increases as the cobalt concentration in Co: TiO2 thin film increases. On the other hand, magnetic coercivity of Co: TiO2 thin films varies from 4 mT to 12 mT and decreases as the concentration of cobalt in Co: TiO2 thin film increases.